Dionysius Joseph Djoko Herry Santjojo


The character of a argon plasma in a DC biased reactor was simulated using 1-dimensional model. The model and simulation was carried out using COMSOL multiphysics software. Results of the simulation show that the model and can be used to predict the character and state of the Ar plasma such as distribution of electron density and Ar+ ion, electron temperature, and electric potential in the plasma space. Furthermore, the model predicts that the argon plasma is formed near the cathode (r<0.5 cm) at the end of the simulation. And, the higher the pressure the higher the plasma density produced at pressures less than 100 Pa.

Full Text:



Langmuir, I. Oscillations in ionized gases. Proc. Nat. Acad. Sci. U.S., vol. 14, p. 628. 1928.

Scholtz, N., Jarmila P., Hana S., Josef K., A tool for decontamination and disinfection. Biotechnology Advances. Vol 33, pp. 1108-1119. 2014

Kapczinski, M.P., Carlos Gil., Eder J.K., Carlos A.S., Surface Modification of Titanium by Plasma Nitriding. Material Research. Vol. 6 pp. 265-271. 2003

Yi, Heon Chen., Tae Whan Kim., Keun-Ho Kim., Woo Seung Kang., Ji Hyun Kim., Soon Kook Hong. Atmospheric Pressure Plasma Ashing for Display Manufacturing. Japanese Journal of Applied Physics. Vol. 47 No. 8S2. 2008

E.E. Yunata and T. Aizawa., Micro-texturing into DLC/diamond coated molds and dies via high density oxygen plasma etching. Manufacturing Review. Pp. 1-7. 2015

Sohbatzadeh, Farshad., et al., Characterization of diamond-like carbon thin film synthesized by RF atmospheric pressure plasma Ar/CH4 jet. Superlattices and Microstructures. Vol. 89 pp. 231-241

Bolshakov, et al., High-rate growth of single crystal diamond in microwave plasma in CH4/H2 and CH4/H2/Ar gas mixtures in presence of intensive soot formation. Diamond and Related Materials. Vol. 62. Pp. 49-57

Yan, Al., Removal of p-chlorophenol in mist by DC corona discharge plasma. Chemical Engineering Journal. Vol. 245. pp. 41-46. 2014



  • There are currently no refbacks.

Creative Commons License
This work is licensed under a Creative Commons Attribution 4.0 International License.